An approach to optical-property profiling of a planar-waveguide structure of Si nanocrystals embedded in SiO2

Nanotechnology

Volumn 16, Issue 11, 2005, Pages 2657-2660

  Ding, L ^a   Chen, T P ^a   Liu, Y ^a   Ng, C Y ^a   Fung, S ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; COMPUTER SIMULATION; ELLIPSOMETRY; MATHEMATICAL MODELS; SECONDARY ION MASS SPECTROMETRY; SILICA; SILICON;

FOROUHI-BLOOMER MODEL; OPTICAL CONSTANTS; OPTICAL LOSS; SPECTROSCOPIC ELLIPSOMETRY (SE);

NANOSTRUCTURED MATERIALS;

EID: 26444551063     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/11/031     Document Type: Article

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