Pattern-integrated interference lithography: Single-exposure fabrication of photonic-crystal structures

Applied Optics

Volumn 51, Issue 18, 2012, Pages 4028-4041

  Burrow, Guy M ^a   Leibovici, Matthieu C R ^a   Gaylord, Thomas K ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; FIBER OPTIC SENSORS; LITHOGRAPHY; MASKS; OPTICAL LATTICES;

FABRICATION OF PHOTONIC CRYSTALS; FUNCTIONAL ELEMENTS; INTEGRATED OPTICAL CIRCUIT; INTERFERENCE LITHOGRAPHY; INTERFERENCE PATTERNS; MULTIBEAM INTERFERENCES; OPTICAL INTENSITIES; PERFORMANCE METRICS;

PHOTONIC CRYSTALS;

EID: 84863523556     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.51.004028     Document Type: Article

References (55)

1. G. M. Burrow and T. K. Gaylord, "Multi-beam interference advances and applications: Nano-electronics, photonic crystals, metamaterials, subwavelength structures, optical trapping, and biomedical structures," Micromachines 2, 221-257 (2011).
2. D. Xia, Z. Ku, S. C. Lee, and S. R. J. Brueck, "Nanostructures and functional materials fabricated by interferometric lithography," Adv. Mater. 23, 147-179 (2011).
3. M. Fritze, T. M. Bloomstein, B. Tyrrell, T. H. Fedynyshyn, N. N. Efremow, Jr., D. E. Hardy, S. Cann, D. Lennon, S. Spector, M. Rothschild, and P. Brooker, "Hybrid optical maskless lithography: Scaling beyond the 45 nm node," J. Vac. Sci. Technol. B 23, 2743-2748 (2005).
4. M. C. Lemme, C. Moormann, H. Lerch, M. Moller, B. Vratzov, and H. Kurz, "Triple-gate metal-oxide-semiconductor field effect transistors fabricated with interference lithography," Nanotechnol. 15, 208-210 (2004).
5. R. T. Greenway, R. Hendel, K. Jeong, A. B. Kahng, J. S. Petersen, Z. Rao, and M. C. Smayling, "Interference assisted lithography for patterning of 1D gridded design," Proc. SPIE 7271, 72712U (2009).
6. V. Berger, O. Gauthier-Lafaye, and E. Costard, "Fabrication of a 2D photonic bandgap by a holographic method," Electron. Lett. 33, 425-426 (1997).
7. M. Campbell, D. N. Sharp, M. T. Harrison, R. G. Denning, and A. J. Turberfield, "Fabrication of photonic crystals for the visible spectrum by holographic lithography," Nature 404, 53-56 (2000).
8. R. C. Rumpf and E. G. Johnson, "Fully three-dimensional modeling of the fabrication and behavior of photonic crystals formed by holographic lithography," J. Opt. Soc. Am. A 21, 1703-1713 (2004).
9. N. Feth, C. Enkrich, M. Wegener, and S. Linden, "Large-area magnetic metamaterials via compact interference lithography," Opt. Express 15, 501-507 (2007).
10. Y. Yang, Q. Z. Li, and G. P. Wang, "Design and fabrication of diverse metamaterial structures by holographic lithography," Opt. Express 16, 11275-11280 (2008).
11. D. Sawaki and J. Amako, "Deep-UV laser-based nanopatterning with holographic techniques," Proc. SPIE 6459, 64590F (2007).
12. J. P. Spallas, A. M. Hawryluk, and D. R. Kania, "Field emitter array mask patterning using laser interference lithography," J. Vac. Sci. Technol. B 13, 1973-1978 (1995).
13. C. H. Liu, M. H. Hong, H. W. Cheung, F. Zhang, Z. Q. Huang, L. S. Tan, and T. S. A. Hor, "Bimetallic structure fabricated by laser interference lithography for tuning surface plasmon resonance," Opt. Express 16, 10701-10709 (2008).
14. M. Duarte, A. Lasagni, R. Giovanelli, J. Narciso, E. Louis, and F. Mucklich, "Increasing lubricant film lifetime by grooving periodical patterns using laser interference metallurgy," Adv. Eng. Mater. 10, 554-558 (2008).
15. R. Murillo, H. A. vanWolferen, L. Abelmann, and J. C. Lodder, "Fabrication of patterned magnetic nanodots by laser interference lithography," Microelectron. Eng. 78-79, 260-265 (2005).
16. E. Schonbrun, R. Piestun, P. Jordan, J. Cooper, K. D. Wulff, J. Courtial, and M. Padgett, "3D interferometric optical tweezers using a single spatial light modulator," Opt. Express 13, 3777-3786 (2005).
17. A. E. Chiou, W. Wang, G. J. Sonek, J. Hong, and M. W. Berns, "Interferometric optical tweezers," Opt. Commun. 133, 7-10 (1997).
18. P. Jakl, T. Cizmar, M. Sery, and P. Zemanek, "Static optical sorting in a laser interference field," Appl. Phys. Lett. 92, 161110 (2008).
19. E. L. Hedberg-Dirk and U. A. Martinez, "Large-scale protein arrays generated with interferometric lithography for spatial control of cell-material interactions," J. Nanomater. 2010, 176750 (2010).
20. J.-H. Jang, D. Dendukuri, H. T. Alan, E. L. Thomas, and P. S. Doyle, "A route to three-dimensional structures in a microfluidic device: Stop-flow interference lithography," Ang. Chem. Int. Ed. 46, 9027-9031 (2007).
21. F. A. Zoller, C. Padeste, Y. Ekinci, H. H. Solak, and A. Engel, "Nanostructured substrates for high density protein arrays," Microelectron. Eng. 85, 1370-1374 (2008).
22. G. M. Burrow and T. K. Gaylord, "Constrained parametric optimization of point geometries in multi-beam-interference lithography," in Frontiers in Optics, OSA Technical Digest (CD) (Optical Society of America, 2010), paper FWS3.
23. L. Z. Cai, X. L. Yang, and Y. R. Wang, "All fourteen Bravais lattices can be formed by interference of four noncoplanar beams," Opt. Lett. 27, 900-902 (2002).
24. A. I. Petsas, A. B. Coates, and G. Grynberg, "Crystallography of optical lattices," Phys. Rev. A 50, 5173-5189 (1994).
25. L. J. Wu, Y. C. Zhong, K. S. Wong, G. P. Wang, and L. Yuan, "Fabrication of hetero-binary and honeycomb photonic crystals by one-step holographic lithography," Appl. Phys. Lett. 88, 091115 (2006).
26. L. Z. Cai, X. L. Yang, and Y. R. Wang, "Interference of three noncoplanar beams: Patterns, contrast and polarization optimization," J. Mod. Opt. 49, 1663-1672 (2002).
27. J. L. Stay and T. K. Gaylord, "Conditions for primitive- latticevector-direction equal contrasts in four-beam-interference lithography," Appl. Opt. 48, 4801-4813 (2009).
28. L. Z. Cai, X. L. Yang, and Y. R. Wang, "Formation of a microfiber bundle by interference of three noncoplanar beams," Opt. Lett. 26, 1858-1860 (2001).
29. J. L. Stay and T. K. Gaylord, "Three-beam-interference lithography: Contrast and crystallography," Appl. Opt. 47, 3221-3230 (2008).
30. N. D. Lai, J. H. Lin, W. P. Liang, C. C. Hsu, and C. H. Lin, "Precisely introducing defects into periodic structures by using a double-step laser scanning technique," Appl. Opt. 45, 5777-5782 (2006).
31. T. Liu, M. Fallahi, J. V. Moloney, and M. Mansuripur, "Fabrication of two-dimensional photonic crystals with embedded defects using blue-laser-writer and optical holography," IEEE Photon Technol. Lett. 18, 1100-1102 (2006).
32. J. Murakowski, G. J. Schneider, and D. Prather, "Fabrication of 3-dimensional photonic crystals with embedded defects," Proc. SPIE 5347, 181-189 (2004).
33. P. Parisse, D. Luciani, A. D'Angelo, S. Santucci, P. Zuppella, P. Tucceri, A. Reale, and L. Ottaviano, "Patterning at the nanoscale: Atomic force microscopy and extreme ultraviolet interference lithography," Mater. Sci. Eng. B 165, 227-230 (2009).
34. C. J. M. van Rijn, "Laser interference as a lithographic nanopatterning tool," J. Microlith. Microfab. Microsyst. 5, 011012 (2006).
35. B. D. Gates, Q. Xu, M. Stewart, D. Ryan, C. G. Willson, and G. M. Whitesides, "New approaches to nanofabrication: Molding, printing, and other techniques," Chem. Rev. 105, 1171-1196 (2005).
36. B. W. Smith, "Alternative optical technologies: More than curiosities?" Proc. SPIE 7274, 21-210 (2009).
37. T. Jhaveri, A. Strojwas, L. Pileggi, and V. Rovner, "Economic assessment of lithography strategies for the 22 nm technology node," Proc. SPIE 7488, 74882Y (2009).
38. N. D. Lai, W. P. Liang, J. H. Lin, and C. C. Hsu, "Rapid fabrication of large-area periodic structures containing welldefined defects by combining holography and mask techniques," Opt. Express 13, 5331-5337 (2005).
39. Y. K. Lin, A. Harb, K. Lozano, D. Xu, and K. P. Chen, "Five beam holographic lithography for simultaneous fabrication of three dimensional photonic crystal templates and line defects using phase tunable diffractive optical element," Opt. Express 17, 16625-16631 (2009).
40. C. A. Mack, Field Guide to Optical Lithgraphy (SPIE, 2006).
41. G. M. Burrow and T. K. Gaylord, "Apparatus and method for photolithographic projection exposure for fabrication of one-, two-, and three-dimensional periodic structures with or without integrated patterns," U.S. patent application 13/249,841 (30 September 2011).
42. G. M. Burrow and T. K. Gaylord, "Interference projection exposure system," in Frontiers in Optics, OSA Technical Digest (CD) (Optical Society of America, 2011), paper FWZ2.
43. G. M. Burrow and T. K. Gaylord, "Diffractive photo-mask for production of non-periodic functional elements integrated within periodic lattices and method for making the same," U.S. patent application 13/250,011 (30 September 2011).
44. S. Boscolo, M. Midrio, and C. G. Someda, "Coupling and decoupling of electromagnetic waves in parallel 2D photonic-crystal waveguides," IEEE J. Quantum Electron. 38, 47-53 (2002).
45. A. K.-K. Wong, Optical Imaging in Projection Microlithography (SPIE Optical Engineering, 2005).
46. J. L. Stay and T. K. Gaylord, "Contrast in four-beaminterference lithography," Opt. Lett. 33, 1434-1436 (2008).
47. J. R. Sheats and B. W. Smith, Microlithography: Science and Technology (Marcel Dekker, 1998).
48. M.BornandE.Wolf, Principles ofOptics,6thed. (Pergamon,1980).
49. Zemax Optical Design Program User's Guide (Focus Software, Inc., 2003).
50. D. C. Cole, E. Barouch, U. Hollerbach, and S. A. Orszag, "Derivation and simulation of higher numerical aperture scalar aerial images," Jpn. J. Appl. Phy. 31, 4110-4119 (1992).
51. MATLAB R2008a (The Mathworks, Natick, Massachusetts).
52. J. L. Stay, G. M. Burrow, and T. K. Gaylord, "Three-beam interference lithography methodology," Rev. Sci. Instrum. 82, 023115 (2011).
53. B. W. Smith and R. Schlief, "Understanding lens aberration and influences on lithographic imaging," Proc. SPIE 4000, 294-306 (2000).
54. D. G. Flagello, T. Milster, and A. E. Rosenbluth, "Theory of high-NA imaging in homogeneous thin films," J. Opt. Soc. Am. A 13, 53-64 (1996).
55. M. Totzeck, P. Graupner, T. Heil, A. Gohnermeier, O. Dittmann, D. Krahmer, V. Kamenov, J. Ruoff, and D. Flagello, "Polarization influence on imaging," J. Microlith. Microfab. Microsyst. 4, 031108 (2005).