The nanostructured phase transition and thermal stability of superhard f-TiN/h-AlSiN films

Surface and Coatings Technology

Volumn 206, Issue 17, 2012, Pages 3572-3579

  Zhang, Shihong ^a   Cai, Fei ^a   Li, Mingxi ^a  

^a ANHUI UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

HRTEM; Multilayers; Ti Al Si N films; Vacuum annealing; XPS

Indexed keywords

ANNEALING EXPERIMENTS; ANNEALING PROCESS; ANNEALING TEMPERATURES; CUBIC PHASE; CUBIC STRUCTURE; HEXAGONAL PHASE; HRTEM; MIXED ORIENTATIONS; MULTIARC ION PLATING; NANO-STRUCTURED; SHARP INTERFACE; SUPERHARD; SUPERHARDNESS; TI-AL-SI-N FILMS; TIN LAYERS; TRANSMISSION ELECTRON MICROSCOPY OBSERVATION; VACUUM ANNEALING;

ALUMINUM; ANNEALING; BOND STRENGTH (MATERIALS); CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; ION IMPLANTATION; METALLIC FILMS; MULTILAYERS; SILICON; SILICON NITRIDE; TINNING; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; VACUUM; VACUUM FURNACES; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACES (MATERIALS);

EID: 84862798147     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.02.037     Document Type: Article

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