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Surface and Coatings Technology

Volumn 200, Issue 5-6, 2005, Pages 1391-1394

Deposition of superhard TiAlSiN thin films by cathodic arc plasma deposition

(4) Kim, S K a Vinh, P V a Kim, J H a Ngoc, T a

a University of Ulsan (South Korea)

Author keywords

Cathodic arc plasma deposition; Superhard properties; TiAlSiN thin films

Indexed keywords

HARDNESS TESTING; INORGANIC COATINGS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; TITANIUM COMPOUNDS; WEAR RESISTANCE;

CATHODIC ARC PLASMA DEPOSITION; NITROGEN GAS PRESSURE; SCRATCH TEST; SUPERHARD PROPERTIES;

PROTECTIVE COATINGS;

CATHODIC ARC PLASMA DEPOSITION; COATING; HARDNESS;

EID: 28944435085 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.08.109 Document Type: Article

Times cited : (87)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.