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Volumn 518, Issue 24, 2010, Pages 7483-7486

Cathodic arc plasma deposited TiAlSiN thin films using an Al-15 at.% Si cathode

Author keywords

Cathodic arc plasma deposition; Multilayered structures; TiAlSiN thin films

Indexed keywords

ARC CURRENT; CATHODIC ARC PLASMA; CATHODIC ARC PLASMA DEPOSITION; CATHODIC ARC PLASMA DEPOSITION SYSTEM; MAXIMUM HARDNESS; MULTI-LAYERED STRUCTURE; NANOCRYSTALLINES; STEEL SUBSTRATE; SUBSTRATE BIAS VOLTAGES; TIALSIN; TIN LAYERS;

EID: 77956881086     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.05.029     Document Type: Conference Paper
Times cited : (30)

References (23)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.