Air-oxidation of nano-multilayered CrAlSiN thin films between 800 and 1000 °C

Surface and Coatings Technology

Volumn 203, Issue 9, 2009, Pages 1199-1204

  Lee, Dong Bok ^a   Nguyen, Thuan Dinh ^a   Kim, Sun Kyu ^b  

^a Sungkyunkwan University   (South Korea)

^b University of Ulsan   (South Korea)

Author keywords

Aluminum; Cathodic arc plasma deposition; CrN thin films; Oxidation; Silicon

Indexed keywords

ALUMINA; ALUMINUM; CAVITY RESONATORS; CHEMICAL VAPOR DEPOSITION; CHROMIUM; CHROMIUM COMPOUNDS; ELECTRIC ARCS; ENERGY ABSORPTION; OXIDATION; OXIDE FILMS; OXYGEN; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SILICON COMPOUNDS; THIN FILMS; TRANSPORTATION ROUTES;

CATHODIC ARC PLASMA DEPOSITION; CRN THIN FILMS; MULTILAYERED; NANO LAYERS; OUTWARD DIFFUSIONS; TEMPERATURE RANGES;

AMORPHOUS FILMS;

EID: 58149522919     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.10.011     Document Type: Article

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