Structure and thermal stability of arc evaporated (Ti0.33Al0.67)1 - xSixN thin films

Thin Solid Films

Volumn 517, Issue 2, 2008, Pages 714-721

  Flink, A ^a   Andersson, J M ^b   Alling, B ^a,c   Daniel, R ^d   Sjolen J ^b   Karlsson, L ^b   Hultman, L ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b SECO TOOLS AB   (Sweden)

^c EPFL   (Switzerland)

^d UNIVERSITY OF LEOBEN   (Austria)

Author keywords

Analytical transmission electron microscopy; Hardness; Phase transitions; TiAlSiN

Indexed keywords

AGE HARDENING; ALUMINUM; ANNEALING; CARBIDES; CAVITY RESONATORS; CRYSTALLIZATION; DENSITY FUNCTIONAL THEORY; HARDNESS; ISOTHERMAL ANNEALING; MICROSCOPIC EXAMINATION; NANOINDENTATION; PHASE TRANSITIONS; PHOTODEGRADATION; PRECIPITATION (CHEMICAL); SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON ALLOYS; SOLID SOLUTIONS; SOLIDIFICATION; SPINODAL DECOMPOSITION; TENSILE STRAIN; THERMODYNAMIC STABILITY; THICK FILMS; TIN; TITANIUM COMPOUNDS; TITANIUM NITRIDE; TURNING; ZINC SULFIDE;

ALLOY FILMS; AMORPHOUS; ANALYTICAL ELECTRON MICROSCOPIES; ANALYTICAL TRANSMISSION ELECTRON MICROSCOPY; ARC EVAPORATIONS; CEMENTED CARBIDE SUBSTRATES; DEPOSITED FILMS; DIFFERENT MICROSTRUCTURES; GRAIN REFINERS; HEXAGONAL WURTZITE; MACHINING PERFORMANCES; METASTABLE; MOLAR VOLUMES; NANOINDENTATION HARDNESSES; PHASE TRANSFORMATIONS; THERMAL STABILITIES; THIN SOLID FILMS; THIN-FILMS; TIALSIN; TURNING OPERATIONS; TURNING TESTS; X-RAY DIFFRACTIONS;

AMORPHOUS FILMS;

EID: 55049100171     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.08.126     Document Type: Article

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