A study of structural and mechanical properties of sputter deposited nanocomposite Ti-Si-N thin films

Surface and Coatings Technology

Volumn 204, Issue 9-10, 2010, Pages 1582-1589

  Chawla, Vipin ^a   Jayaganthan, R ^a   Chandra, Ramesh ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY ROORKEE   (India)

Author keywords

Microstructural characterization; Nanoindentation; Sputtering; Ti Si N films

Indexed keywords

AFM; AFM IMAGE; AMORPHOUS MATRICES; AMORPHOUS STRUCTURES; CHARACTERIZATION TECHNIQUES; DEPOSITION PARAMETERS; GRAIN BOUNDARY HARDENING; GRAIN MORPHOLOGIES; GRAIN SIZE; MICRO-STRAIN; MICROSTRUCTURAL ANALYSIS; MICROSTRUCTURAL CHARACTERIZATION; NANOINDENTOR; NITROGEN SOURCES; PYRAMIDAL SHAPE; SEM; SI CONTENT; SI(1 0 0); STRUCTURAL AND MECHANICAL PROPERTIES; TEM; TI-SI-N; TWO-PHASE STRUCTURES; XRD; XRD ANALYSIS; YOUNG'S MODULUS;

AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HARDNESS; MECHANICAL PROPERTIES; METALLIC FILMS; NANOCOMPOSITES; NANOINDENTATION; SEMICONDUCTING SILICON COMPOUNDS; SILICON; STAINLESS STEEL; SURFACE ROUGHNESS; THIN FILMS; TITANIUM COMPOUNDS; TITANIUM NITRIDE; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS FILMS;

EID: 71049150021     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.10.001     Document Type: Article

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