Effect of the microstructure on the cutting performance of superhard (Ti,Si,Al)N nanocomposite films

Vacuum

Volumn 82, Issue 12, 2008, Pages 1470-1474

  Fernandes, C ^a   Carvalho, S ^a   Rebouta, L ^a   Vaz, F ^a   Denannot, M F ^b   Pacaud, J ^b   Riviere J P ^b   Cavaleiro, A ^c  

^a UNIVERSITY OF MINHO   (Portugal)

^b UNIVERSITÉ DE POITIERS   (France)

^c UNIVERSITY OF COIMBRA   (Portugal)

Author keywords

(Ti,Si,Al)N; HRTEM; Microstructure; XRD

Indexed keywords

ALUMINUM; DEPOSITION RATES; FIBER OPTICS; HIGH RESOLUTION ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IMAGE ENHANCEMENT; MAGNETRON SPUTTERING; MAGNETRONS; MICROCRYSTALLINE SILICON; MICROSTRUCTURE; NANOCOMPOSITES; NANOSTRUCTURED MATERIALS; REACTIVE SPUTTERING; SILICON; SPUTTER DEPOSITION; TIN; TITANIUM COMPOUNDS; TITANIUM NITRIDE; TUNGSTEN CARBIDE; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS;

(TI,SI,AL)N; ASYMMETRIC MODES; BRIGHT-FIELD IMAGES; COLUMNAR STRUCTURES; CUTTING PERFORMANCES; DEPOSITION CHAMBERS; FIBER TEXTURES; HIGH-DEPOSITION RATES; HRTEM; HRTEM IMAGES; MULTILAYER STACKING; N COATINGS; NANO-COMPOSITE FILMS; REACTIVE MAGNETRON SPUTTERING; ROCKING CURVES; SUPERHARD; X-RAY DIFFRACTION; XRD;

CUTTING TOOLS;

EID: 49149084265     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.03.050     Document Type: Article

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