High-temperature oxidation of nano-multilayered TiAlCrSiN thin films in air

Surface and Coatings Technology

Volumn 204, Issue 5, 2009, Pages 697-704

  Nguyen, Thuan Dinh ^a   Kim, Sun Kyu ^b   Lee, Dong Bok ^a  

^a Sungkyunkwan University   (South Korea)

^b University of Ulsan   (South Korea)

Author keywords

Cathodic arc plasma deposition; Nanolayered film; Oxidation; TiAlCrSiN

Indexed keywords

AL-IONS; APPARENT ACTIVATION ENERGY; CATHODIC ARC PLASMA DEPOSITION; CRALSIN FILMS; FILM OXIDATION; HIGH TEMPERATURE OXIDATION; INWARD DIFFUSION; MIXED LAYER; MULTI-LAYERED; NANO LAYERS; OUTWARD DIFFUSION; OXIDE LAYER; OXYGEN IONS; TIN FILMS; TIO;

ACTIVATION ENERGY; ALUMINUM; CAVITY RESONATORS; CHEMICAL VAPOR DEPOSITION; CHROMIUM; DIFFUSION; ELECTRIC ARCS; IONS; OXIDATION; OXIDE MINERALS; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; TITANIUM NITRIDE; TITANIUM OXIDES;

PLASMA DEPOSITION;

EID: 71749107281     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.09.008     Document Type: Article

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