-
2
-
-
84862530610
-
-
U.S. patent 5882987
-
K. V. Srikrishnan, U.S. patent 5882987 (1999).
-
(1999)
-
-
Srikrishnan, K.V.1
-
3
-
-
0031150267
-
-
10.1016/S0167-9317(97)00055-5
-
B. Aspar, M. Bruel, H. Moriceau, C. Maleville, T. Poumeyrol, A. M. Papon, A. Claverie, G. Benassayag, A. J. Auberton-Hervé, and T. Barge, Microelectron. Eng. 36, 233 (1997). 10.1016/S0167-9317(97)00055-5
-
(1997)
Microelectron. Eng.
, vol.36
, pp. 233
-
-
Aspar, B.1
Bruel, M.2
Moriceau, H.3
Maleville, C.4
Poumeyrol, T.5
Papon, A.M.6
Claverie, A.7
Benassayag, G.8
Auberton-Hervé, A.J.9
Barge, T.10
-
4
-
-
21544474632
-
-
10.1063/1.98946
-
E. Yablonovitch, T. Gmitter, J. P. Harbison, and R. Bhat, Appl. Phys. Lett. 51, 2222 (1987). 10.1063/1.98946
-
(1987)
Appl. Phys. Lett.
, vol.51
, pp. 2222
-
-
Yablonovitch, E.1
Gmitter, T.2
Harbison, J.P.3
Bhat, R.4
-
5
-
-
77950330878
-
-
10.1063/1.3372635
-
W. Yang, H. Yang, G. Qin, Z. Ma, J. Berggren, M. Hammar, R. Soref, and W. Zhou, Appl. Phys. Lett. 96, 121107 (2010). 10.1063/1.3372635
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 121107
-
-
Yang, W.1
Yang, H.2
Qin, G.3
Ma, Z.4
Berggren, J.5
Hammar, M.6
Soref, R.7
Zhou, W.8
-
6
-
-
77952993872
-
-
10.1002/adma.200902927
-
D. H. Kim, J. Xiao, J. Song, Y. Huang, and J. A. Rogers, Adv. Mater. 22, 2108 (2010). 10.1002/adma.200902927
-
(2010)
Adv. Mater.
, vol.22
, pp. 2108
-
-
Kim, D.H.1
Xiao, J.2
Song, J.3
Huang, Y.4
Rogers, J.A.5
-
7
-
-
24144437205
-
-
10.1063/1.1993757
-
S. J. Wang, K. M. Uang, S. L. Chen, Y. C. Yang, and S. C. Chang, Appl. Phys. Lett. 87, 011111 (2005). 10.1063/1.1993757
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 011111
-
-
Wang, S.J.1
Uang, K.M.2
Chen, S.L.3
Yang, Y.C.4
Chang, S.C.5
-
10
-
-
39549119163
-
-
10.1109/LPT.2007.912491
-
J. S. Ha, S. W. Lee, H. J. Lee, H. J. Lee, S. H. Lee, H. Goto, T. Kato, K. Fujii, M. W. Cho, and T. Yao, IEEE Photonics Technol. Lett. 20, 175 (2008). 10.1109/LPT.2007.912491
-
(2008)
IEEE Photonics Technol. Lett.
, vol.20
, pp. 175
-
-
Ha, J.S.1
Lee, S.W.2
Lee, H.J.3
Lee, H.J.4
Lee, S.H.5
Goto, H.6
Kato, T.7
Fujii, K.8
Cho, M.W.9
Yao, T.10
-
11
-
-
80053557481
-
-
10.1149/2.002111esl
-
Y. Tsai, R.-H. Horng, D.-S. Wuu, S.-L. Ou, M.-T. Hung, and H.-H. Hsueh, Electrochem. Solid-State Lett. 14, H434 (2011). 10.1149/2.002111esl
-
(2011)
Electrochem. Solid-State Lett.
, vol.14
, pp. 434
-
-
Tsai, Y.1
Horng, R.-H.2
Wuu, D.-S.3
Ou, S.-L.4
Hung, M.-T.5
Hsueh, H.-H.6
-
12
-
-
24144466514
-
-
10.1063/1.2012533
-
J. Dorsaz, H. J. Bühlmann, J. F. Carlin, N. Grandjean, and H. Ilegems, Appl. Phys. Lett. 87, 072102 (2005). 10.1063/1.2012533
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 072102
-
-
Dorsaz, J.1
Bühlmann, H.J.2
Carlin, J.F.3
Grandjean, N.4
Ilegems, H.5
-
13
-
-
0035952838
-
-
10.1063/1.1352663
-
R. Stonas, T. Margalith, S. P. DenBaars, L. A. Coldren, and E. L. Hu, Appl. Phys. Lett. 78, 1945 (2001). 10.1063/1.1352663
-
(2001)
Appl. Phys. Lett.
, vol.78
, pp. 1945
-
-
Stonas, R.1
Margalith, T.2
Denbaars, S.P.3
Coldren, L.A.4
Hu, E.L.5
-
14
-
-
66749140352
-
-
10.1063/1.3153116
-
J. Park, K. M. Song, S. R. Jeon, J. H. Baek, and S. W. Ryu, Appl. Phys. Lett. 94, 221907 (2009). 10.1063/1.3153116
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 221907
-
-
Park, J.1
Song, K.M.2
Jeon, S.R.3
Baek, J.H.4
Ryu, S.W.5
-
15
-
-
79251537464
-
-
10.1143/APEX.4.012104
-
C. Y. Cho, S. J. Lee, S. H. Hong, S. C. Park, S. E. Park, Y. Park, and S. J. Park, Appl. Phys. Express 4, 012104 (2011). 10.1143/APEX.4.012104
-
(2011)
Appl. Phys. Express
, vol.4
, pp. 012104
-
-
Cho, C.Y.1
Lee, S.J.2
Hong, S.H.3
Park, S.C.4
Park, S.E.5
Park, Y.6
Park, S.J.7
-
17
-
-
34047229255
-
-
10.1088/0268-1242/22/4/022
-
R. Singh, I. Radu, G. Bruederl, C. Eichler, V. Haerle, U. Gösele, and S. H. Christiansen, Semicond. Sci. Technol. 22, 418 (2007). 10.1088/0268-1242/22/4/022
-
(2007)
Semicond. Sci. Technol.
, vol.22
, pp. 418
-
-
Singh, R.1
Radu, I.2
Bruederl, G.3
Eichler, C.4
Haerle, V.5
Gösele, U.6
Christiansen, S.H.7
-
18
-
-
77953082678
-
-
10.1007/s11671-010-9601-6
-
K. Y. Zang, D. W. C. Cheong, H. F. Liu, H. Liu, J. H. Teng, and S. J. Chua, Nanoscale Res. Lett. 5, 1051 (2010). 10.1007/s11671-010-9601-6
-
(2010)
Nanoscale Res. Lett.
, vol.5
, pp. 1051
-
-
Zang, K.Y.1
Cheong, D.W.C.2
Liu, H.F.3
Liu, H.4
Teng, J.H.5
Chua, S.J.6
-
19
-
-
0001904229
-
-
10.1063/1.120263
-
J. Han, T. B. Ng, R. M. Biefield, M. H. Crawford, and D. M. Follstaedt, Appl. Phys. Lett. 71, 3114 (1997). 10.1063/1.120263
-
(1997)
Appl. Phys. Lett.
, vol.71
, pp. 3114
-
-
Han, J.1
Ng, T.B.2
Biefield, R.M.3
Crawford, M.H.4
Follstaedt, D.M.5
-
20
-
-
77954587518
-
-
10.1002/pssb.200983650
-
Y. Zhang, S. W. Ryu, C. Yerino, B. Leung, Q. Sun, Q. Song, H. Cao, and J. Han, Phys. Status Solidi B 247, 1713 (2010). 10.1002/pssb.200983650
-
(2010)
Phys. Status Solidi B
, vol.247
, pp. 1713
-
-
Zhang, Y.1
Ryu, S.W.2
Yerino, C.3
Leung, B.4
Sun, Q.5
Song, Q.6
Cao, H.7
Han, J.8
-
21
-
-
79251588418
-
-
10.1088/0957-4484/22/4/045603
-
Y. Zhang, Q. Sun, B. Leung, J. Simon, M. L. Lee, and J. Han, Nanotechnology 22, 045603 (2011). 10.1088/0957-4484/22/4/045603
-
(2011)
Nanotechnology
, vol.22
, pp. 045603
-
-
Zhang, Y.1
Sun, Q.2
Leung, B.3
Simon, J.4
Lee, M.L.5
Han, J.6
-
22
-
-
0004013464
-
-
(Cambridge University Press)
-
P. Haasen, Physical Metallurgy (Cambridge University Press, 1978), p. 196.
-
(1978)
Physical Metallurgy
, pp. 196
-
-
Haasen, P.1
-
23
-
-
79959578706
-
-
10.1063/1.3601861
-
C. D. Yerino, Y. Zhang, B. Leung, M. L. Lee, T. C. Hsu, C. K. Wang, W. C. Peng, and J. Han, Appl. Phys. Lett. 98, 251910 (2011). 10.1063/1.3601861
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 251910
-
-
Yerino, C.D.1
Zhang, Y.2
Leung, B.3
Lee, M.L.4
Hsu, T.C.5
Wang, C.K.6
Peng, W.C.7
Han, J.8
-
24
-
-
33846970512
-
-
10.1063/1.2437056
-
C. B. Soh, H. Hartono, S. Y. Chow, S. J. Chua, and E. A. Fitzgerald, Appl. Phys. Lett. 90, 053112 (2007). 10.1063/1.2437056
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 053112
-
-
Soh, C.B.1
Hartono, H.2
Chow, S.Y.3
Chua, S.J.4
Fitzgerald, E.A.5
-
25
-
-
34248579190
-
-
10.1063/1.2732826
-
H. Hartono, C. B. Soh, S. Y. Chow, S. J. Chua, and E. A. Fitzgerald, Appl. Phys. Lett. 90, 171917 (2007) 10.1063/1.2732826.
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 171917
-
-
Hartono, H.1
Soh, C.B.2
Chow, S.Y.3
Chua, S.J.4
Fitzgerald, E.A.5
-
26
-
-
0035480371
-
-
10.1016/S0022-0248(01)01468-3
-
S. K. Mathis, A. E. Romanov, L. F. Chen, G. E. Beltz, W. Pompe, and J. S. Speck, J. Cryst. Growth 231, 371 (2001). 10.1016/S0022-0248(01)01468-3
-
(2001)
J. Cryst. Growth
, vol.231
, pp. 371
-
-
Mathis, S.K.1
Romanov, A.E.2
Chen, L.F.3
Beltz, G.E.4
Pompe, W.5
Speck, J.S.6
-
27
-
-
0346728728
-
-
10.1063/1.123070
-
S. Hearne, E. Chason, J. Han, J. A. Floro, J. Figiel, J. Hunter, H. Amano, and I. S. T. Tsong, Appl. Phys. Lett. 74, 356 (1999). 10.1063/1.123070
-
(1999)
Appl. Phys. Lett.
, vol.74
, pp. 356
-
-
Hearne, S.1
Chason, E.2
Han, J.3
Floro, J.A.4
Figiel, J.5
Hunter, J.6
Amano, H.7
Tsong, I.S.T.8
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