Dislocation density reduction in GaN by dislocation filtering through a self-assembled monolayer of silica microspheres

Applied Physics Letters

Volumn 94, Issue 23, 2009, Pages

  Li, Qiming ^a   Figiel, Jeffrey J ^a   Wang, George T ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLOSE-PACKED MONOLAYERS; DISLOCATION BLOCKING; DISLOCATION DENSITY REDUCTION; DISLOCATION FILTERING; ORDERS OF MAGNITUDE; SELECTIVE GROWTH; SILICA MICROSPHERES; THREADING DISLOCATION; THREADING DISLOCATION DENSITIES;

ATOMIC FORCE MICROSCOPY; CORUNDUM; ELECTRON ENERGY LEVELS; GALLIUM ALLOYS; GALLIUM NITRIDE; MICROSPHERES; ORGANIC POLYMERS; SEMICONDUCTING GALLIUM; SILICA;

SELF ASSEMBLED MONOLAYERS;

EID: 67649099562     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3152012     Document Type: Article

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