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Volumn 12, Issue 5, 2012, Pages 1372-1377
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High performance GaAs metal-insulator-semiconductor devices using TiO 2 as insulator layer
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Author keywords
Current voltage temperature; GaAs semiconductor; Gaussian distribution; Metal insulator semiconductor
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Indexed keywords
BARRIER HEIGHT INHOMOGENEITY;
BARRIER HEIGHTS;
CURRENT-VOLTAGE MEASUREMENTS;
CURRENT-VOLTAGE-TEMPERATURE;
DEVICE TECHNOLOGIES;
ELECTRICAL CHARACTERISTIC;
GAAS;
GAAS SUBSTRATES;
GAUSSIANS;
IDEALITY FACTORS;
INHOMOGENEITIES;
INSULATOR LAYER;
METAL INSULATORS;
METAL SEMICONDUCTOR INTERFACE;
METAL-INSULATOR SEMICONDUCTOR DEVICES;
METAL-INSULATOR-SEMICONDUCTORS;
POTENTIAL MODEL;
RICHARDSON CONSTANT;
RICHARDSON PLOT;
TEMPERATURE DEPENDENCE;
TEMPERATURE RANGE;
THEORETICAL VALUES;
TIO;
ZERO-BIAS;
GALLIUM ARSENIDE;
GAUSSIAN DISTRIBUTION;
MIM DEVICES;
MIS DEVICES;
SEMICONDUCTING GALLIUM;
TITANIUM DIOXIDE;
CURRENT VOLTAGE CHARACTERISTICS;
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EID: 84861575579
PISSN: 15671739
EISSN: None
Source Type: Journal
DOI: 10.1016/j.cap.2012.03.030 Document Type: Article |
Times cited : (29)
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References (51)
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