Review of current progress in nanometrology with the helium ion microscope

Measurement Science and Technology

Volumn 22, Issue 2, 2011, Pages

  Postek, Michael T ^a   Vladár, András ^a   Archie, Charles ^b   Ming, Bin ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b IBM RESEARCH   (United States)

Author keywords

Critical dimension; Helium ion; HIM; Microscope; Nanomanufacturing; Nanometrology; Scanning electron microscope; SEM

Indexed keywords

ELECTRONS; HELIUM; INDUSTRIAL RESEARCH; ION BEAMS; ION MICROSCOPES; ION SOURCES; MICROSCOPES; UNITS OF MEASUREMENT;

CRITICAL DIMENSION; HELIUM ION; HELIUM ION MICROSCOPE (HIM); HELIUM ION MICROSCOPES; MANUFACTURING FACILITY; MEASUREMENT PROCESS; NANO-MANUFACTURING; NANOMETROLOGY;

SCANNING ELECTRON MICROSCOPY;

EID: 79251498310     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/22/2/024004     Document Type: Review

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