State of the art in atomic resolution off-axis electron holography

Ultramicroscopy

Volumn 116, Issue , 2012, Pages 13-23

  Linck, Martin ^a   Freitag, Bert ^b   Kujawa, Stephan ^b   Lehmann, Michael ^c   Niermann, Tore ^c  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b Thermo Fisher Scientific   (United States)

^c TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

Aberration correction; Atomic resolution; High brightness electron gun; Holography

Indexed keywords

ABERRATION CORRECTION; ATOMIC RESOLUTION; ELECTRON DOSE; FIELD ELECTRON EMITTERS; HIGH BRIGHTNESS; HIGH RESOLUTION; INTERFERENCE FRINGE; OFF-AXIS ELECTRON HOLOGRAPHY; PHASE SIGNALS; SCHOTTKY; SIGNAL RESOLUTION; STATE OF THE ART; STRUCTURE PROPERTY RELATION; TRANSMISSION ELECTRON MICROSCOPE;

CESIUM; ELECTRIC POTENTIAL; ELECTRON GUNS; ELECTRON HOLOGRAPHY; ELECTRONS; GRAIN BOUNDARIES; HOLOGRAMS; HOLOGRAPHY; LUMINANCE; MAGNETIC FIELDS; MICROSCOPES; TRANSMISSION ELECTRON MICROSCOPY;

ATOMS;

AMPLITUDE MODULATION; ARTICLE; BRIGHTNESS; CONTROLLED STUDY; FIELD EMISSION; HOLOGRAPHY; IMAGE DISPLAY; IMAGE ENHANCEMENT; IMAGE PROCESSING; IMAGE QUALITY; IMAGE RECONSTRUCTION; LIMIT OF DETECTION; MATHEMATICAL MODEL; MODULATION TRANSFER FUNCTION; SIGNAL NOISE RATIO;

EID: 84859907777     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2012.01.019     Document Type: Article

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