Current and future aberration correctors for the improvement of resolution in electron microscopy

Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences

Volumn 367, Issue 1903, 2009, Pages 3665-3682

  Haider, M ^a   Hartel, P ^a   Muller, H ^a   Uhlemann, S ^a   Zach, J ^a  

^a CEOS GmbH   (Germany)

Author keywords

Aberration correction; Electron microscopy; High resolution; Scanning transmission electron microscope; Transmission electron microscope

Indexed keywords

ABERRATIONS; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; ELECTRONS; SEMICONDUCTOR QUANTUM WIRES; SPHERES;

ABERRATION CORRECTION; ABERRATION CORRECTORS; CHROMATIC ABERRATION; FIELD OF VIEWS; HIGH RESOLUTION; IN-SITU; LOW-VOLTAGE; OBJECTIVE LENS; SCANNING TRANSMISSION ELECTRON MICROSCOPE; SENSITIVE MATERIALS; SPHERICAL ABERRATIONS; TEM; TRANSMISSION ELECTRON MICROSCOPE; ULTRAHIGH RESOLUTION;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

EID: 70349417948     PISSN: 1364503X     EISSN: None     Source Type: Journal    
DOI: 10.1098/rsta.2009.0121     Document Type: Article

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