Medium resolution off-axis electron holography with millivolt sensitivity

Applied Physics Letters

Volumn 91, Issue 14, 2007, Pages

  Cooper, David ^a   Truche, Robert ^a   Rivallin, Pierrette ^a   Hartmann, Jean Michel ^a   Laugier, Frederic ^a   Bertin, Francois ^a   Chabli, Amal ^a   Rouviere, Jean Luc ^b  

^a CEA LETI   (France)

^b MINATEC   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BORON DOPED LAYERS; PHASE IMAGES; SILICON CALIBRATION SPECIMENS;

CALIBRATION; CCD CAMERAS; FOCUSED ION BEAMS; SENSITIVITY ANALYSIS; SIGNAL TO NOISE RATIO; SILICON;

ELECTRON HOLOGRAPHY;

EID: 34948861805     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2794006     Document Type: Article

References (8)

1. W. D. Rau, P. Schwander, F. H. Baumann, W. Hoppner, and A. Ourmazd, Phys. Rev. Lett. 82, 2614 (1999).
2. International Technology Roadmap for Semiconductors, 2001 ed. (Semiconductor Industry Association, San Jose, CA, 2001) (http://public.itrs. net).
3. A. Harscher and H. Lichte, Ultramicroscopy 64, 57 (1994).
4. W. J. De Ruijter and J. K. Weiss, Ultramicroscopy 50, 269 (1993).
5. D. Cooper, A. C. Twitchett, P. A. Midgley, and R. E. Dunin-Borkowski, J. Appl. Phys. 101, 094508 (2007).
6. D. Cooper, A. C. Twitchett, P. K. Somodi, I. Farrer, D. A. Ritchie, P. A. Midgley, and R. E. Dunin-Borkowski, Appl. Phys. Lett. 88, 063510 (2006).
7. D. Cooper, Ultramicroscopy (to be published).
8. A. C. Twitchett, R. E. Dunin-Borkowski, R. J. Hallifax, R. F. Broom, and P. A. Midgley, Phys. Rev. Lett. 88, 2383021 (2002).