Hitachi's high-end analytical electron microscope: HF-3300

Hitachi Review

Volumn 57, Issue 3, 2008, Pages 132-135

  Sato, Takeshi ^a,b   Matsumoto, Hiroaki ^c,d   Konno, Mitsuru ^c,d   Taniguchi, Yoshifumi ^c,e   Mamishin, Shuichi ^f,g  

^a Nanotechnology Products Business Group

^b Japanese Society of Microscopy (JSM)

^c HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^d JSM ^*

^e JAPAN SOCIETY OF APPLIED PHYSICS   (Japan)

^f Naka Division

^g JSAP   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 46249128409     PISSN: None     EISSN: 0018277X     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (4)

1. A. Tonomura, Electron Holography Springer Series in Optical Sciences 70, Springer-Verlag, Heidelberg (1993).
2. T. Sato et al., M&M proceedings (2008).
3. K. Kimoto et al., "Chemical Shift Mapping of Si L and K Edges Using Spatially Resolved EELS and Energy-Filtering TEM," Journal of Electron Microscopy 46, 369 (1997).
4. T. Sekiguchi et al., "Nitrogen Distribution and Chemical Bonding State Analysis in Oxynitride Film by Spatially Resolved Electron Energy Loss Spectroscopy (EELS)," Japanese Journal of Applied Physics 37, L694 (1998).