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Volumn 3, Issue 2, 2012, Pages 369-376

Design and preparation of porous polybenzoxazole films using the tert-butoxycarbonyl group as a pore generator and their application for patternable low-k materials

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL INERTNESS; DEVICE PERFORMANCE; EXCELLENT SOLUBILITY; FILM MORPHOLOGY; FUNCTIONALIZATIONS; HIGH THERMAL CONDUCTIVITY; INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS; K-VALUES; LOW COEFFICIENT OF THERMAL EXPANSIONS; LOW DIELECTRIC CONSTANTS; LOW-K MATERIALS; MECHANICAL TOUGHNESS; MICRO PATTERNING; POLY (P-PHENYLENE BENZOBISOXAZOLE); POLYBENZOXAZOLE FILMS; PROCESSABILITY; TERT-BUTOXYCARBONYL (T-BOC);

EID: 84855701357     PISSN: 17599954     EISSN: 17599962     Source Type: Journal    
DOI: 10.1039/c1py00470k     Document Type: Article
Times cited : (48)

References (52)
  • 4
    • 84889707103 scopus 로고    scopus 로고
    • International Technology Roadmap for Semiconductors
    • International Technology Roadmap for Semiconductors, 2009, http://www.itrs.net/Links/2009ITRS/2009Chapters-2009Tables/2009-Interconnect.pdf
    • (2009)
  • 14
    • 84855656073 scopus 로고    scopus 로고
    • Materials Research Society Symposium - Proceedings
    • T. Enoki, K. Maejima, H. Saito and A. Katsumura, Materials Research Society Symposium - Proceedings, 2002
    • (2002)
    • Enoki, T.1    Maejima, K.2    Saito, H.3    Katsumura, A.4
  • 27
    • 84889694656 scopus 로고    scopus 로고
    • http://www.toyobo.co.jp/e/seihin/kc/pbo/Technical-Information-2005.pdf


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.