Development of photosensitive poly(benzoxazole) based on a poly(o-hydroxy amide), a dissolution inhibitor, and a photoacid generator

Journal of Photopolymer Science and Technology

Volumn 22, Issue 4, 2009, Pages 429-435

  Ogura, Tomohito ^a   Higashihara, Tomoya ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Dissolution inhibitor; Photoacid generator; Photosensitive polymer; Poly(benzoxazole)

Indexed keywords

EID: 77952200566     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.429     Document Type: Article

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