Dielectric property-microstructure relationship for nanoporous silica based thin films

Journal of Applied Physics

Volumn 95, Issue 10, 2004, Pages 5762-5767

  Fisher, I ^a   Kaplan, W D ^a   Eizenberg, M ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ELLIPSOMETRY; FINITE ELEMENT METHOD; MATHEMATICAL MODELS; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROSITY; POROUS MATERIALS; RAYLEIGH SCATTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS;

NANOPOROUS MATERIALS; SPIN-ON DEPOSITION (SOD); X-RAY REFLECTIVITY;

SILICA;

EID: 2942594247     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1699491     Document Type: Article

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