Deposition of silicon dioxide films on amorphous carbon films by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

Applied Physics Letters

Volumn 70, Issue 9, 1997, Pages 1078-1079

  Endo, Kazuhiko ^a   Tatsumi, Toru ^a   Matsubara, Yoshihisa ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040221689     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118490     Document Type: Article

References (9)

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