SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology B

Volumn 29, Issue 6, 2011, Pages

Actinic characterization of extreme ultraviolet bump-type phase defects

(2) Goldberg, Kenneth A a Mochi, Iacopo a

a LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; MACHINE TOOLS; MULTILAYERS;

ACTINIC INSPECTION; DETECTION CAPABILITY; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; HIGH MAGNIFICATIONS; MULTI-LAYER-COATING; PHASE CHANGE MODEL; SMALL DISTURBANCES;

INSPECTION EQUIPMENT;

EID: 84255183991 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3653257 Document Type: Article

Times cited : (6)

References (26)

1
- 77953456290
- U. Okoroanyanwu, A. Tchikoulaeva, P. Ackmann, O. Wood, B. La Fontaine, K. Bubke, C. Holfeld, J.-H. Peters, S. Kini, S. Watson, I. Lee, B. Mu, P. Lim, S. Raghunathan, C. Boye, Proc. SPIE 7636, 7636J (2010).
- (2010) Proc. SPIE , vol.7636
- Okoroanyanwu, U.¹ Tchikoulaeva, A.² Ackmann, P.³ Wood, O.⁴ La Fontaine, B.⁵ Bubke, K.⁶ Holfeld, C.⁷ Peters, J.-H.⁸ Kini, S.⁹ Watson, S.¹⁰ Lee, I.¹¹ Mu, B.¹² Lim, P.¹³ Raghunathan, S.¹⁴ Boye, C.¹⁵

2
- 78650132449
- 10.1116/1.3498757
- K. A. Goldberg and I. Mochi, J. Vac. Sci. Technol. B 28 (6), C6E1 (2010). 10.1116/1.3498757
- (2010) J. Vac. Sci. Technol. B , vol.28 , Issue.6
- Goldberg, K.A.¹ Mochi, I.²

3
- 35148843759
- EUV and non-EUV inspection of reticle defect repair sites
- DOI 10.1117/12.712202, Emerging Lithographic Technologies XI
- K. A. Goldberg, A. Barty, P. Seidel, K. Edinger, R. Fettig, P. Kearney, H. Han, and O. R. Wood II, Proc. SPIE 6517, 65170C (2007). 10.1117/12.712202 (Pubitemid 47550739)
- (2007) Proceedings of SPIE - The International Society for Optical Engineering , vol.6517 , Issue.PART 1
- Goldberg, K.A.¹ Barty, A.² Seidel, P.³ Edinger, K.⁴ Fettig, R.⁵ Kearney, P.⁶ Han, H.⁷ Wood II, O.R.⁸

4
- 34648836133
- Aerial image mask inspection system for extreme ultraviolet lithography
- DOI 10.1143/JJAP.46.6113
- H. Kinoshita, K. Hamamoto, N. Sakaya, M. Hosoya, and T. Watanabe, Jpn. J. Appl. Phys., Part 1 46, 6113 (2007). 10.1143/JJAP.46.6113 (Pubitemid 47463404)
- (2007) Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers , vol.46 , Issue.9 , pp. 6113-6117
- Kinoshita, H.¹ Hamamoto, K.² Sakaya, N.³ Hosoya, M.⁴ Watanabe, T.⁵

5
- 77957904636
- 10.1117/12.863818
- S. Herbert, A. Maryasov, L. Juschkin, R. Lebert, and K. Bergmann, Proc. SPIE 7545, 75450O (2010). 10.1117/12.863818
- (2010) Proc. SPIE , vol.7545
- Herbert, S.¹ Maryasov, A.² Juschkin, L.³ Lebert, R.⁴ Bergmann, K.⁵

6
- 67149104324
- 10.1117/12.814261
- I. Mochi, K. A. Goldberg, P. Naulleau, and S. Huh, Proc. SPIE 7271, 727123 (2009). 10.1117/12.814261
- (2009) Proc. SPIE , vol.7271 , pp. 727123
- Mochi, I.¹ Goldberg, K.A.² Naulleau, P.³ Huh, S.⁴

7
- 85067710271
- Monterey, CA, September 15, , (unpublished)
- T. Liang, SPIE Photomask BACUS Meeting., Monterey, CA, September 15, (2010), (unpublished).
- (2010) SPIE Photomask BACUS Meeting
- Liang, T.¹

8
- 0036118745
- Practical approach for modeling extreme ultraviolet lithography mask defects
- DOI 10.1116/1.1428269
- E. M. Gullikson, C. Cerjan, D. G. Stearns, P. B. Mirkirimi, and D. W. Sweeney, J. Vac. Sci. Technol. B 20 (1), 81 (2002). 10.1116/1.1428269 (Pubitemid 34221389)
- (2002) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.20 , Issue.1 , pp. 81-86
- Gullikson, E.M.¹ Cerjan, C.² Stearns, D.G.³ Mirkarimi, P.B.⁴ Sweeney, D.W.⁵

9
- 62749160061
- 10.1117/12.801529
- K. A. Goldberg, I. Mochi, P. P. Naulleau, H.-S. Han, and S. Huh, Proc. SPIE 7122, 71222E (2008). 10.1117/12.801529
- (2008) Proc. SPIE , vol.7122
- Goldberg, K.A.¹ Mochi, I.² Naulleau, P.P.³ Han, H.-S.⁴ Huh, S.⁵

10
- 67149112242
- 10.1117/12.824433
- K. A. Goldberg, I. Mochi, and S. Huh, Proc. SPIE 7271, 72713N (2009). 10.1117/12.824433
- (2009) Proc. SPIE , vol.7271
- Goldberg, K.A.¹ Mochi, I.² Huh, S.³

11
- 85067722127
- Princeton Instruments, PIXIS-XO CCD camera
- Princeton Instruments, PIXIS-XO CCD camera, see http://www. princetoninstruments.com/products/xraycam/pisx/

12
- 85066725402
- I. Mochi, K. A. Goldberg, P. Naulleau, and S. Huh, Proc. SPIE 7271, 76361A (2009)
- (2009) Proc. SPIE , vol.7271
- Mochi, I.¹ Goldberg, K.A.² Naulleau, P.³ Huh, S.⁴

13
- 85067711890
- (22 May)
- D. W. Sweeney and A. K. Ray-Chaudhuri, U.S. patent 6, 235, 434 (22 May 2001).
- (2001) U.S. Patent , vol.6 , Issue.235 , pp. 434
- Sweeney, D.W.¹ Ray-Chaudhuri, A.K.²

14
- 77957913481
- M. Waiblinger, K. Kornilov, T. Hofmann, and K. Edinger, Proc. SPIE 7545, 75450P (2010).
- (2010) Proc. SPIE , vol.7545
- Waiblinger, M.¹ Kornilov, K.² Hofmann, T.³ Edinger, K.⁴

15
- 72849133842
- 10.1116/1.3244624
- C. H. Clifford, S. Wiraatmadja, T. T. Chan, A. R. Neureuther, K. A. Goldberg, I. Mochi, and T. Liang, J. Vac. Sci. Technol. B 27, 2888-2893 (2009). 10.1116/1.3244624
- (2009) J. Vac. Sci. Technol. B , vol.27 , pp. 2888-2893
- Clifford, C.H.¹ Wiraatmadja, S.² Chan, T.T.³ Neureuther, A.R.⁴ Goldberg, K.A.⁵ Mochi, I.⁶ Liang, T.⁷

16
- 77953445283
- 10.1117/12.847956
- I. Kang, H. Seo, B. Ahn, D. Lee, D. Kim, and S. Huh, Proc. SPIE 7636, 76361B (2010). 10.1117/12.847956
- (2010) Proc. SPIE , vol.7636
- Kang, I.¹ Seo, H.² Ahn, B.³ Lee, D.⁴ Kim, D.⁵ Huh, S.⁶

17
- 77957894992
- 10.1117/12.863559
- S. Huh, A. Rastegar, S. Wurm, and K. Goldberg, Proc. SPIE 7545, 75450N (2010). 10.1117/12.863559
- (2010) Proc. SPIE , vol.7545
- Huh, S.¹ Rastegar, A.² Wurm, S.³ Goldberg, K.⁴

18
- 78650092759
- 10.1116/1.3498756
- I. Mochi, K. A. Goldberg, and S. Huh, J. Vac. Sci. Technol. B 28, C6E11 (2010). 10.1116/1.3498756
- (2010) J. Vac. Sci. Technol. B , vol.28
- Mochi, I.¹ Goldberg, K.A.² Huh, S.³

19
- 79957959125
- I. Mochi, K. A. Goldberg, R. Xie, P.-Y. Yan, and K. Yamazoe, Proc. SPIE 7969, 7969X (2011).
- (2011) Proc. SPIE , vol.7969
- Mochi, I.¹ Goldberg, K.A.² Xie, R.³ Yan, P.-Y.⁴ Yamazoe, K.⁵

20
- 78649841171
- Ph.D. dissertation (University of California-Berkeley)
- C. H. Clifford, Simulation and compensation methods for EUV lithography masks with buried defects, Ph.D. dissertation (University of California-Berkeley, 1997).
- (1997) Simulation and Compensation Methods for EUV Lithography Masks with Buried Defects
- Clifford, C.H.¹

21
- 1842474990
- 10.1117/12.517836
- T. Kinoshita, T. Shoki, H. Kobayashi, R. Ohkubo, Y.-I. Usui, M. Hosoya, N. Sakaya, and O. Nagarekawa, SPIE 5256, 595 (2003). 10.1117/12.517836
- (2003) SPIE , vol.5256 , pp. 595
- Kinoshita, T.¹ Shoki, T.² Kobayashi, H.³ Ohkubo, R.⁴ Usui, Y.-I.⁵ Hosoya, M.⁶ Sakaya, N.⁷ Nagarekawa, O.⁸

22
- 77953426648
- 10.1117/12.850825
- S. Stokowski, J. Glasser, G. Inderhees, and P. Sankuratri, Proc. SPIE 7636, 76360Z (2010). 10.1117/12.850825
- (2010) Proc. SPIE , vol.7636
- Stokowski, S.¹ Glasser, J.² Inderhees, G.³ Sankuratri, P.⁴

23
- 3142692472
- 10.1364/AO.43.004025
- P. P. Naulleau, Appl. Opt. 43 (20), 4025 (2004). 10.1364/AO.43.004025
- (2004) Appl. Opt. , vol.43 , Issue.20 , pp. 4025
- Naulleau, P.P.¹

24
- 79957963201
- 10.1117/12.881524
- S. A. George, P. P. Naulleau, E. M. Gullikson, I. Mochi, F. Salmassi, K. A. Goldberg, and E. H. Anderson, Proc. SPIE 7969, 79690E (2011). 10.1117/12.881524
- (2011) Proc. SPIE , vol.7969
- George, S.A.¹ Naulleau, P.P.² Gullikson, E.M.³ Mochi, I.⁴ Salmassi, F.⁵ Goldberg, K.A.⁶ Anderson, E.H.⁷

25
- 0141618858
- 10.1116/1.588656
- R. J. Socha, A. R. Neureuther, J. Vac. Sci. Technol. B 14 (6), 3724 (1996). 10.1116/1.588656
- (1996) J. Vac. Sci. Technol. B , vol.14 , Issue.6 , pp. 3724
- Socha, R.J.¹ Neureuther, A.R.²

26
- 0141654572
- Ph.D. dissertation (University of California-Berkeley)
- R. J. Socha, Propagation effects of partially coherent light in optical lithography and inspection, Ph.D. dissertation (University of California-Berkeley, 1997).
- (1997) Propagation Effects of Partially Coherent Light in Optical Lithography and Inspection
- Socha, R.J.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.