Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2888-2893

  Clifford, Chris H ^a   Wiraatmadja, Sandy ^a   Chan, Tina T ^a   Neureuther, Andrew R ^a   Goldberg, Kenneth A ^b   Mochi, Iacopo ^b   Liang, Ted ^c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTINIC INSPECTION; AERIAL IMAGES; BURIED DEFECT; CRITICAL DIMENSION; DEFECT PRINTABILITY; DEFECT SIZE; EUV MASK; EXTREME ULTRAVIOLET MASKS; EXTREME ULTRAVIOLETS; ILLUMINATION CONDITIONS; SURFACE HEIGHT; THREE DIMENSIONAL SIMULATIONS; WORST CASE;

EXTREME ULTRAVIOLET LITHOGRAPHY; MASKS; SURFACE DEFECTS; THREE DIMENSIONAL; THREE DIMENSIONAL COMPUTER GRAPHICS; ULTRAVIOLET DEVICES;

DEFECTS;

EID: 72849133842     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3244624     Document Type: Conference Paper

References (7)

1. Conclusion of Steering Committee at the 2008 EUVL Symposium (unpublished).
2. K. A. Goldberg, I. Mochi, and S. Huh, Proc. SPIE 7271, 72713N (2009).
3. C. H. Clifford and A. R. Neureuther, J. Micro/Nanolith. MEMS MOEMS 8, 031402 (2009).
4. T. Liang et al., J. Vac. Sci. Technol. B 25, 2098 (2007).
5. C. H. Clifford and A. R. Neureuther, Proc. SPIE 6921, 692119 (2008).
6. C. H. Clifford, S. Wiraatmadja, T. T. Chan, A. R. Neureuther, K. A. Goldberg, I. Mochi, and T. Liang, Proc. SPIE 7271, 72711F (2009).
7. D. G. Stearns, P. B. Mirkarimi, and E. Spiller, Thin Solid Films 446, 37 (2004).