Study of real defects on EUV blanks and a strategy for EUV mask inspection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7545, Issue , 2010, Pages

  Huh, Sungmin ^a   Rastegar, Abbas ^a   Wurm, Stefan ^a   Goldberg, Kenneth ^b   Mochi, Iacopo ^b   Nakajima, Toshio ^c   Kishimoto, Masahiro ^c   Komakine, Mitsuhiko ^c  

^a SEMATECH   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c AGC Electronics America   (United States)

Author keywords

Actinic inspection; Confocal DUV inspection; EUV; Mask; Phase defect

Indexed keywords

ACTINIC INSPECTION; ATOMIC FORCE MICROSCOPES; CONFOCAL DUV INSPECTION; DEFECT FREE MASK; EUV; EUV BLANK; EUV MASK; EUV MASK BLANKS; GAUSSIANS; HIGH VOLUME MANUFACTURING; INTENSITY PROFILES; MASK BLANK; NATIVE DEFECT; PHASE DEFECTS; REAL DEFECTS; SEMATECH; SHAPED DEFECTS; SURFACE HEIGHT;

INSPECTION; LITHOGRAPHY; PHOTOMASKS;

SURFACE DEFECTS;

EID: 77957894992     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.863559     Document Type: Conference Paper

References (6)

1. Yun, H., Goodwin, F., Huh, S., Orvek, K., Cha, B., Rastegar, A., Kearney, P., "SEMATECH EUVL mask program status," Proceedings of SPIE Vol. 7379, 73790G (2009).
2. K. A. Goldberg, A. Barty, Y. Liu, P. Kearney, Y. Tezuka, T. Terasawa, J. S. Taylor, H. S. Han, and O. R. Wood II., J. Vac. Sci. & Technol. B 24 (6), 2824 (2006).
3. K. A. Goldberg, P. P. Naulleau, A. Barty, S. B. Rekawa, C. D. Kemp, R. F. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, H. S. Han, Proc. SPIE 6730, 67305E (2007).
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5. Huh, S., Kearney, Kearney, P., Wurm, S., Goodwin, F., Han, H., Goldberg, K., Mochi, I., Gullikson, E., "EUV actinic defect inspection and defect printability at the sub-32-nm half-pitch," Proceedings of SPIE Vol. 7470, 74700Y (2009).
6. Stefan Wurm, Hakseung Han, Patrick Kearney, Wonil Cho, Chan-Uk Jeon, and Eric Gullikson, Proc. SPIE 6607, 66073A, (2007).