Improving the performance of the Actinic Inspection Tool with an optimized alignment procedure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Mochi, Iacopo ^a   Goldbergs, Kenneth A ^a   Naulleau, Patrick ^a   Huh, Sungmin ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b SEMATECH   (United States)

Author keywords

Aberrations; Aerial image; Alignment; EUV; Mask inspection; Zoneplate

Indexed keywords

ACTINIC INSPECTION; ADVANCED LIGHT SOURCE; AERIAL IMAGE; AERIAL IMAGE MEASUREMENT; CHARACTERISTICS OF DEFECT; DATA COLLECTION; DATA THROUGHPUT; DEFECT REPAIR; DIRECT ACCESS; EUV; EUV MASK; EUV MICROSCOPE; EXTREME ULTRAVIOLET MICROSCOPIES; FRESNEL; HIGH VACUUM; ILLUMINATION UNIFORMITY; IMAGING RESOLUTIONS; LAWRENCE BERKELEY NATIONAL LABORATORY; LITHOGRAPHY SYSTEMS; MAGNITUDE REDUCTION; MASK INSPECTION; NUMERICAL APERTURE; OFF-AXIS; PERFORMANCE IMPROVEMENTS; SEMATECH; ZONEPLATE;

ABERRATIONS; CHARGE COUPLED DEVICES; INSPECTION; INSPECTION EQUIPMENT; LENSES; LIGHT; LIGHT SOURCES; OPTICAL INSTRUMENTS; OPTICAL SYSTEMS; PHOTOMASKS; ULTRAVIOLET DEVICES;

ALIGNMENT;

EID: 67149104324     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814261     Document Type: Conference Paper

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