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Journal of Vacuum Science and Technology B

Volumn 28, Issue 6, 2010, Pages

Actinic imaging and evaluation of phase structures on extreme ultraviolet lithography masks

(3) Mochi, Iacopo a Goldberg, Kenneth A a Huh, Sungmin b

a LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

b SAMSUNG Electronics (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNAS; EXTREME ULTRAVIOLET LITHOGRAPHY; MASKS; OPTICAL INSTRUMENTS; PHASE STRUCTURE;

COMPLEX AMPLITUDE; DEFECT PRINTABILITY; DEFECT REPAIR; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET LITHOGRAPHY MASKS; MASK FEATURES; NATIVE DEFECT; PHASE COMPONENT; PHASE RETRIEVAL ALGORITHM; PREDICTIVE MODELS;

DEFECTS;

EID: 78650092759 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3498756 Document Type: Article

Times cited : (10)

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