Physical vapor deposition of molecular glass photoresists: a new route to chemically amplified patterning

Advanced Functional Materials

Volumn 17, Issue 14, 2007, Pages 2336-2342

  Pfeiffer, Frauke ^a   Felix, Nelson M ^b   Neuber, Christian ^a   Ober, Christopher K ^b   Schmidt, Hans Werner ^a  

^a UNIVERSITY OF BAYREUTH   (Germany)

^b Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); DEPOSITION; MONOMERS; OPTIMIZATION; PHYSICAL VAPOR DEPOSITION; SOLVENTS;

MOLECULAR GLASS PHOTORESISTS; PHOTOACID GENERATOR; SOLVENT-FREE PROCESS; SYSTEMATIC VARIATIONS;

PHOTORESISTS;

EID: 34948899266     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.200600717     Document Type: Article

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