Amorphous molecular materials: Development of a novel negative electron-beam molecular resist

Journal of Photopolymer Science and Technology

Volumn 13, Issue 2, 2000, Pages 203-204

  Kadota, Toshiaki ^a   Kageyama, Hiroshi ^a   Wakaya, Fujio ^b   Gamo, Kenji ^b   Shirota, Yasuhiko ^a  

^a OSAKA UNIVERSITY   (Japan)

^b Faculty of Engineering

Author keywords

Amorphous molecular material; Molecular resist; Negative electron beam resist; Resolution; Sensitivity

Indexed keywords

ARTICLE; CHEMICAL ANALYSIS; ELECTRON BEAM; MATERIALS; MATERIALS TESTING; MOLECULE; NANOTECHNOLOGY;

EID: 0034584028     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.13.203     Document Type: Article

References (5)