Effect of water-contact on the roughness of patterned photoresist investigated by AFM analysis

Journal of Applied Polymer Science

Volumn 104, Issue 4, 2007, Pages 2361-2365

  Ahn, Sung Il ^a   Kim, Jae Hyun ^b   Zin, Wang Cheol ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

AFM; Diffusion; Roughness; Swelling

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFUSION; ELLIPSOMETRY; GRAVIMETRIC ANALYSIS; SURFACE ROUGHNESS; SWELLING;

IMMERSION LITHOGRAPHY; PATTERNED LINE EDGE; ROOT MEAN SQUARE (RMS);

PHOTORESISTS;

DIFFUSION; MATHEMATICAL MODEL; MICROSCOPY;

EID: 34147196272     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.25718     Document Type: Article

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