Lithography based on molecular glasses

Journal of Photopolymer Science and Technology

Volumn 18, Issue 3, 2005, Pages 431-434

  Tsuchiya, Kousuke ^a   Chang, Seung Wook ^b   Felix, Nelson M ^b   Ueda, Mitsuru ^a   Ober, Christopher K ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b Cornell University   (United States)

Author keywords

E beam lithography; Hexa(hydroxyphenyl)benzene; Line edge roughness; Molecular glasses

Indexed keywords

EID: 22144478289     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.18.431     Document Type: Article

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