Amorphous molecular materials : Development of a novel positive electron-beam molecular resist

Journal of Photopolymer Science and Technology

Volumn 12, Issue 2, 1999, Pages 375-376

  Kadota, Toshiaki ^a   Kageyama, Hiroshi ^a   Wakaya, Fujio ^a   Gamo, Kenji ^a   Shirota, Yasuhiko ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

1,3,5 tris 4 (2 tert butoxy carbonyloxy)phenyl benzene; Amorphous molecular material; Chemically amplified resist; Molecular resist; Positive electron beam resist; Resolution; Sensitivity

Indexed keywords

EID: 0000289726     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.375     Document Type: Article

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