Amorphous molecular materials: Development of novel negative electron-beam molecular resists

Materials Science and Engineering C

Volumn 16, Issue 1-2, 2001, Pages 91-94

  Kadota, Toshiaki ^a   Kageyama, Hiroshi ^a   Wakaya, Fujio ^a   Gamo, Kenji ^a   Shirota, Yasuhiko ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Amorphous molecular material; Molecular resist; Negative electron beam resist; Resolution; Sensitivity

Indexed keywords

AMORPHOUS MATERIALS; ELECTRON BEAM LITHOGRAPHY; FABRICATION;

AMORPHOUS MOLECULAR MATERIALS;

ELECTRON BEAMS;

ELECTRON BEAM MACHINING;

EID: 0035922731     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0928-4931(01)00301-0     Document Type: Article

References (9)