Enhancements of extreme ultraviolet emission using prepulsed Sn laser-produced plasmas for advanced lithography applications

Journal of Applied Physics

Volumn 110, Issue 8, 2011, Pages

  Freeman, J R ^a   Harilal, S S ^a   Hassanein, A ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED LITHOGRAPHY; DELAY TIMING; EUV EMISSIONS; EXTREME ULTRAVIOLET EMISSION; EXTREME ULTRAVIOLETS; GARNET LASERS; INITIAL OPTIMIZATION; ION SIGNALS; LASER INTENSITIES; LITHOGRAPHY SYSTEMS; NEXT GENERATION LITHOGRAPHY; PUMPING PULSE; REDUCED COST;

CARBON DIOXIDE; CONVERSION EFFICIENCY; EMISSION SPECTROSCOPY; LASER PRODUCED PLASMAS; LIGHT SOURCES; LITHOGRAPHY; OPTICAL PUMPING; OPTIMIZATION; PUMPS; TIN; ULTRAVIOLET SPECTROSCOPY; YTTRIUM;

ULTRAVIOLET LASERS;

EID: 80655139274     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3647779     Document Type: Article

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