Tin ion and neutral dynamics within an LPP EUV source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Rollinger, Bob ^a   Morris, Oran ^a   Chokani, Ndaona ^a   Abhari, Reza S ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

atomic physics; computational; EUV source; hydrodynamics; laser plasma; lithography

Indexed keywords

AXISYMMETRIC; COLLECTOR OPTICS; COMPUTATIONAL; DENSITY DISTRIBUTIONS; DROPLET INTERACTION; ENERGETIC ION; EUV SOURCE; FUNDAMENTAL FREQUENCIES; HYDRODYNAMIC SIMULATION; IMPACT ANGLES; ION ENERGIES; LASER PLASMA; LIFE-TIMES; ND : YAG LASERS; NON-UNIFORMITIES; NONUNIFORM; NORMAL INCIDENCE; PLASMA EXPANSION; SIMULATION RESULT; SPUTTERING YIELDS; TIN ATOMS; TIN DROPLETS; TIN VAPOR;

ATOMS; DROP FORMATION; EXTREME ULTRAVIOLET LITHOGRAPHY; FLUID DYNAMICS; HYDRODYNAMICS; IONS; LASER BEAMS; LASER PRODUCED PLASMAS; LIGHT SOURCES; LITHOGRAPHY; PLASMA INTERACTIONS; PULSED LASER APPLICATIONS; SPUTTERING; TIN; TITANIUM COMPOUNDS; ULTRAVIOLET DEVICES;

NEODYMIUM LASERS;

EID: 77953427209     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846557     Document Type: Conference Paper

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