Development of CO2 laser produced Xe plasma EUV light source for microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Mizoguchi, Hakaru ^a   Endo, Akira ^a   Ariga, Tatsuya ^a   Miura, Taisuke ^a   Hoshino, Hideo ^a   Ueno, Yoshifumi ^a   Nakano, Masaki ^a   Komori, Hiroshi ^a   Sumitani, Akira ^a   Abe, Tamotsu ^a   Suganuma, Takashi ^a   Soumagne, Georg ^a   Someya, Hiroshi ^a   Takabayashi, Yuichi ^a   Toyoda, Koichi ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

CO2 Laser; Droplet; EUV light source; Laser produced plasma; Magnetic field; Xe plasma

Indexed keywords

AXIAL FLOW; CARBON DIOXIDE; LASERS; LITHOGRAPHY; MAGNETIC FIELDS; OPTICAL WAVEGUIDES; PLASMAS; XENON;

CO2 LASER; DROPLET; EUV LIGHT SOURCE; LASER-PRODUCED PLASMA; XE PLASMA;

LIGHT SOURCES;

EID: 33745595841     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656941     Document Type: Conference Paper

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