Combined effects of prepulsing and target geometry on efficient extreme ultraviolet production from laser produced plasma experiments and modeling

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 10, Issue 3, 2011, Pages

  Hassanein, Ahmed ^a   Sizyuk, Tatyana ^a   Sizyuk, Valeryi ^a   Harilal, Sivanandan S ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

Extreme ultraviolet; HEIGHTS Debris mitigation; Laser produced plasma; Nanolithography

Indexed keywords

CARBON DIOXIDE; CONVERSION EFFICIENCY; ENERGY DISSIPATION; ENERGY EFFICIENCY; EXPERIMENTS; EXTREME ULTRAVIOLET LITHOGRAPHY; GEOMETRY; LASER BEAM EFFECTS; LASER PRODUCED PLASMAS; LIGHT SOURCES; PHOTONS; TIN; TIN OXIDES; YTTRIUM;

ADVANCED LITHOGRAPHY; COMBINED EFFECT; COMPLEX GEOMETRIES; COMPLEX TARGETS; ENERGETIC ION; EUV SOURCE; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; HEIGHTS/DEBRIS MITIGATION; HIGHER HARMONICS; LABORATORY EXPERIMENTS; LASER ENERGIES; LASER WAVELENGTH; NANOPOROUS TIN; PHOTON SOURCES; PLASMA PLUMES; PREPULSES; PULSE PARAMETER;

ULTRAVIOLET LASERS;

EID: 80055028481     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3609043     Document Type: Article

References (15)

1. 2 and Nd: YAG laser-produced tin plasmas," J. Phys.: Conf. Ser. 112, 042059 (2008).
2. D. Campos, S. S. Harilal, and A. Hassanein, "The effect of laser wavelength on emission and particle dynamics of Sn plasma," J. Appl. Phys. 108, 113305 (2010).
3. F.Barkusky,A.Bayer, S.Döring, P. Grossmann, andK.Mann, "Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source," Opt. Express 18(5), 4346-4355 (2010).
4. 2 laser pulse," Appl. Phys. Lett. 92, 251501 (2008).
5. V. Bakshi, "EUV source technology: Challenges and status," EUV Sources for Lithography, V. Bakshi,Ed. SPIE Press, Bellingham,Washington USA, 7 (2005).
6. Y. Izawa, K. Nishihara, H. Tanuma, A. Sasaki, M. Murakami, A. Sunahara, H. Nishimura, S. Fujioka, T. Aota, Y. Shimada, M. Yamaura, M. Nakatsuka, H. Fujita, K. Tsubakimoto, H. Yoshida, N. Miyanaga, and K. Mima, in "EUV light source by high power laser," J. Phys.: Conf. Ser. 112, 042047 (2008).
7. V. Sizyuk, A. Hassanein, V. Morozov, V. Tolkach, and T. Sizyuk, "Numerical simulation of laser-produced plasma devices for EUV lithography using the HEIGHTS integrated model," Numer. Heat Transfer, Part A 49, 215-236 (2006). (Pubitemid 43065434)
8. V. Sizyuk, A. Hassanein, and T. Sizyuk, "Three-dimensional simulation of laser-produced plasma for extreme ultraviolet lithography applications," J. Appl. Phys. 100, 103106 (2006).
9. A. Hassanein, V. Sizyuk, T. Sizyuk, and S. Harilal, "Effects of plasma spatial profile on conversion efficiency of laser-produced plasma sources for EUV lithography," J. Micro/Nanolith MEMS MOEMS 8, 041503 (2009).
10. 2 laser-produced plasma for EUV lithography sources," Proc. SPIE 7636, 76360A (2010).
11. F. Herman and S. Skillman, Atomic Structure Calculations, Prentice Hall, Englewood Cliffs, NJ (1963).
12. D. Zaltzmann, Atomic Physics in Hot Plasmas, Chap. 4, Oxford University Press, New York (1998).
13. V. Bakshi, "EUV source technology: Challenges and status," in EUV Sources forLithography,V.Bakshi, Ed., SPIE Press,Bellingham,Washington USA, 13 (2005).
14. 2 laser produced plasma euv source examination with the Code Z," EUV Source Workshop, Baltimore, Maryland (2007).
15. H. Nishimura, S. Fujioka, M. Shimomura, H. Sakaguchi, Y. Nakai, T. Aota, T. Kai, K. Nishihara, N. Miyanaga, Y. Izawa, K. Mima, A. Sunahara, Y. Shimada and S. Namba, "Development of extreme-ultraviolet light source by laser-produced plasma," Rev. Laser Eng. 36, 1125-1128 (2008).