Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Nishihara, K ^a   Sunahara, A ^b   Sasaki, A ^c   Fujioka, S ^a   Shimada, Y ^b   Nunami, M ^a   Tanuma, H ^d   Murakami, M ^a   Aota, T ^a   Fujima, K ^e   Furukawa, H ^b   Nishikawa, T ^f   Koike, F ^g   More, R ^h   Kato, T ^h   Zhakhovskii, V ^a   Gamata, K ^a   Ueda, H ^a   Nishimura, H ^a   Yuba, Y ^a   Nagai, K ^a   Miyanaga, N ^a   Izawa, Y ^a   Mima, K ^a   more..

^a OSAKA UNIVERSITY   (Japan)

^b INSTITUTE FOR LASER TECHNOLOGY   (Japan)

^c JAPAN ATOMIC ENERGY AGENCY   (Japan)

^d TOKYO METROPOLITAN UNIVERSITY   (Japan)

^e UNIVERSITY OF YAMANASHI   (Japan)

^f OKAYAMA UNIVERSITY   (Japan)

^g KITASATO UNIVERSITY SCHOOL OF MEDICINE   (Japan)

^h NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

Author keywords

Conversion efficiency from laser to euv; Debris mitigation; EUVL (Extreme ultraviolet light source for lithography); Ion mitigation by magnetic field; LPP (Laser produced plasma); Radiation hydrodynamic simulation; Tin cleaning; Tin plasma

Indexed keywords

13.5 NM; DEBRIS MITIGATION; DOUBLE PULSE LASER; ENERGY REDUCTION; EUV LIGHT SOURCES; EXTREME ULTRAVIOLET EMISSION; HIGH CONVERSION EFFICIENCY; HYDRO CODES; ION SPUTTERING; LASER ENERGIES; MAGNETIC COIL; MAIN PULSE; MD SIMULATION; ND : YAG LASERS; OUT OF BAND; PREPULSES; RADIATION HYDRODYNAMIC SIMULATION; TIN DROPLETS; TIN PLASMA; TWO-COLOR LASER;

CARBON DIOXIDE; CARBON DIOXIDE LASERS; CONVERSION EFFICIENCY; DEBRIS; ENERGY EFFICIENCY; EXTREME ULTRAVIOLET LITHOGRAPHY; IONS; LASER PRODUCED PLASMAS; LIGHT SOURCES; MAGNETIC FIELDS; MAGNETOPLASMA; TIN; ULTRAVIOLET LASERS; ULTRAVIOLET RADIATION;

NEODYMIUM LASERS;

EID: 78649267951     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.769086     Document Type: Conference Paper

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