Modeling and optimization of debris mitigation systems for laser and discharge-produced plasma in extreme ultraviolet lithography devices

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 6, Issue 4, 2007, Pages

  Sizyuk, Valeryi ^a   Hassanein, Ahmed ^a   Bakshi, Vivek ^b  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b SEMATECH   (United States)

Author keywords

Debris mitigation; Discharge produced plasma; Laser produced plasma; Lithography; Monte Carlo method; Numerical simulation

Indexed keywords

CHARGED PARTICLES; COMPUTER SIMULATION; EXTREME ULTRAVIOLET LITHOGRAPHY; MONTE CARLO METHODS; OPTIMIZATION; WASTE DISPOSAL;

DEBRIS MITIGATION; DISCHARGE-PRODUCED PLASMAS; LASER-PRODUCED PLASMAS;

MATHEMATICAL MODELS;

EID: 37549045627     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2804128     Document Type: Article

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