Laser structuring of luminescent porous silicon during etching

Journal of Porous Materials

Volumn 7, Issue 1, 2000, Pages 367-371

  Starovoitov, A ^a   Bayliss, S ^a  

^a DE MONTFORT UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; ETCHING; LASER APPLICATIONS; OPTICAL MATERIALS; PHOTOCHEMICAL REACTIONS; PHOTOLITHOGRAPHY; PHOTOLUMINESCENCE; PHOTOSENSITIVITY; SEMICONDUCTING SILICON; ULTRAVIOLET RADIATION;

LASER STRUCTURING; LIGHT ASSISTED ETCHING;

POROUS SILICON;

EID: 0033878024     PISSN: 13802224     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1009695223104     Document Type: Article

References (11)

1. L.T. Canham, Appl. Phys. Lett. 57, 1046 (1990).
2. S.C. Bayliss, D.A. Hutt, Q. Zhang, P. Harris, Fillips, and A. Smith, Thin Solid Films 255, 128-131 (1995).
3. A.G. Nassiopolous, S. Grigoropoulos, L. Canham, A. Halimaoui, I. Berbezier, E. Gogolides, and D. Papadimitriou, Thin Solid Films 255, 329-333 (1995).
4. N. Noguchi and I. Suemune, Appl. Phys. Lett. 62(12), 1429 (1993).
5. W. Schottky, "Halbleitertheory der Sperrschicht" Naturwissenchaften 26, 843 (1938).
6. G. Lerondel, R. Romestain, and J.C. Vial, Appl. Phys. Lett. 71, 196 (1997).
7. X.G. Zhang, J. Electrochem. Soc. 138(12), 3750 (1991).
8. G.G. John and V.A. Singh, Phys. Rev. B 50, 8, 5329 (1994).
9. A.G. Gullis, L.T. Canham, and P.D.J. Calcott, J. Appl. Phys. 82(3), 909 (1997).
10. D. Bellet and G. Dolino, Phys. Rev. B 50, 17162 (1994).
11. V.M. Dubin, F. Ozaman, and J.-N. Chazelviel, Phys. Rev. B 50, 14867 (1994).