The mechanism of formation of microneedles on the silicon surface in fluorinated plasma via the cyclic etching-deposition process

High Energy Chemistry

Volumn 42, Issue 5, 2008, Pages 399-403

  Amirov, I I ^a   Shumilov, A S ^a  

^a IOFFE INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 52949095692     PISSN: 00181439     EISSN: 16083148     Source Type: Journal    
DOI: 10.1134/S0018143908050111     Document Type: Article

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