Antireflective porous layer formation on multicrystalline silicon by metal particle enhanced HF etching

Solar Energy

Volumn 80, Issue 6, 2006, Pages 701-706

  Yae, Shinji ^a,b   Kobayashi, Tsutomu ^a   Kawagishi, Tatsunori ^a   Fukumuro, Naoki ^a   Matsuda, Hitoshi ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Antireflection; Electroless deposition; Photoelectrochemical solar cells; Porous silicon; Textured surface

Indexed keywords

ELECTROLESS PLATING; ETCHING; PHOTOELECTROCHEMICAL CELLS; POROUS SILICON; REFLECTION; SILICON WAFERS;

ANTIREFLECTION; ELECTROLESS DEPOSITION; PHOTOELECTROCHEMICAL SOLAR CELLS; TEXTURED SURFACE;

SOLAR CELLS;

ELECTROLESS PLATING; ETCHING; PHOTOELECTROCHEMICAL CELLS; POROUS SILICON; REFLECTION; SILICON WAFERS; SOLAR CELLS;

ALKALINIZATION; CRYSTALLINITY; METAL; PLATINUM; POROUS MEDIUM; SILICON;

EID: 33646895428     PISSN: 0038092X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solener.2005.10.011     Document Type: Article

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