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Journal of Vacuum Science and Technology B

Volumn 29, Issue 4, 2011, Pages

Improved oxidation resistance of Ru/Si capping layer for extreme ultraviolet lithography reflector

(4) Park, Jeong Y a Belau, Leonid b Seo, Hyungtak b Somorjai, Gabor A b,c

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

b LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

c UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; EXTREME ULTRAVIOLET LITHOGRAPHY; MORPHOLOGY; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; SILICON; SURFACE MORPHOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL DURABILITY; EXTREME ULTRAVIOLET REFLECTORS; OXIDATION STATE; RU CAPPING LAYERS; SURFACE ETCHING; SURFACE MORPHOLOGY AND ROUGHNESS; SURFACE OXIDATIONS; UV/OZONE TREATMENT;

REFLECTION;

EID: 80051906973 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3596560 Document Type: Article

Times cited : (3)

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