Atomic hydrogen cleaning of surface Ru oxide formed by extreme ultraviolet irradiation of Ru-capped multilayer mirrors in H2O ambience

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 25-28, 2007, Pages

  Oizumi, Hiroaki ^a,b   Izumi, Akira ^b   Motai, Kumi ^a   Nishiyama, Iwao ^a   Namiki, Akira ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Atomic hydrogen; Cleaning; Deoxidatlon; EUV lithography; EUV reflectivity; Hot tungsten wire; Multilayer mirror; Oxidation; Ru capping layer

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; MEASUREMENT ERRORS; OXIDATION; RUTHENIUM COMPOUNDS; SURFACE STRUCTURE; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC HYDROGEN; CENTROID WAVELENGTH; DEOXIDATLON; HOT TUNGSTEN WIRE; HYDROGEN CLEANING; MULTILAYER MIRRORS; RU CAPPING LAYER;

SURFACE CLEANING;

EID: 34547850458     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.L633     Document Type: Article

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