Oxidation and reduction of thin Ru films by gas plasma

Applied Surface Science

Volumn 253, Issue 21, 2007, Pages 8699-8704

  Iwasaki, Y ^a   Izumi, A ^a   Tsurumaki, H ^a   Namiki, A ^a   Oizumi, H ^b   Nishiyama, I ^b  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Oxidation; Plasma treatment; Reduction; Ru; Surface reaction

Indexed keywords

ANNEALING; DESORPTION; REDOX REACTIONS; RUBIDIUM; SILICON; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

GAS PLASMA; OXIDE LAYER; PLASMA TREATMENT; RU FILMS;

THIN FILMS;

EID: 34547225040     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.04.063     Document Type: Article

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