The effects of oxygen plasma on the chemical composition and morphology of the Ru capping layer of the extreme ultraviolet mask blanks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2225-2229

  Belau, Leonid ^a   Park, Jeong Y ^b   Liang, Ted ^c   Somorjai, Gabor A ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL METHODS; ATOMIC FORCES; CHEMICAL COMPOSITIONS; CHEMISORBED OXYGENS; ETCHING RATES; EUV LITHOGRAPHIES; EUV MASKS; EXTREME ULTRAVIOLET MASKS; KIRKENDALL EFFECTS; MORPHOLOGICAL CHANGES; OXYGEN PLASMAS; PLAUSIBLE MECHANISMS; RU CAPPING LAYERS; SECTIONAL ANALYSES; SUBSURFACE OXYGENS; SURFACE OXIDATIONS; TAKEOFF ANGLES; X-RAY PHOTOELECTRON SPECTROSCOPIES;

ATOMIC SPECTROSCOPY; CHEMICAL ANALYSIS; CHEMICAL OXYGEN DEMAND; CHEMISORPTION; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PULSES; NONMETALS; OXIDATION; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTOMASKS; PHOTONS; PHOTORESISTS; PLASMA APPLICATIONS; PLASMAS; RUTHENIUM; SURFACE ROUGHNESS; SURFACE TREATMENT; ULTRAVIOLET DEVICES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 57249086343     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3021368     Document Type: Article

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