Electrochemically enhanced wet cleaning of Ru capping thin film for EUV lithography reflector

Journal of the Electrochemical Society

Volumn 157, Issue 4, 2010, Pages

  Seo, Hyungtak ^a,b   Park, Jeong Y ^a,b,d   Liang, Ted ^c   Somorjai, Gabor A ^a,b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c INTEL CORPORATION   (United States)

^d Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMBINED EFFECT; ELECTROCHEMICAL INTERACTIONS; ELECTROSTATIC INTERACTIONS; EUV LITHOGRAPHY; NANOPARTICLE SURFACE; PROPYLENE CARBONATE; RU THIN FILMS; SURFACE PASSIVATION; TETRAMETHYL AMMONIUM HYDROXIDE; WET CLEANING;

CHEMICAL CLEANING; CHEMISORPTION; PASSIVATION; PROPYLENE; REFLECTION; SURFACE ACTIVE AGENTS; THIN FILM DEVICES; THIN FILMS; ULTRAVIOLET DEVICES;

SURFACE CLEANING;

EID: 77949728832     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3298727     Document Type: Article

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