Etching of ruthenium coatings in O 2- and Cl 2- containing plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 1, 2006, Pages 1-8

  Hsu, C C ^a   Coburn, J W ^a   Graves, D B ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OXYGEN RADICAL DENSITY; RUTHENIUM COATINGS; RUTHENIUM FILM ETCHING;

CHLORINE; ETCHING; OBJECT ORIENTED PROGRAMMING; PLASMA DENSITY; PLASMAS;

RUTHENIUM;

EID: 84858519805     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2121751     Document Type: Article

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