Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2098-2103

  Liang, Ted ^a   Ultanir, Erdem ^a   Zhang, Guojing ^a   Park, Seh Jin ^a   Anderson, Erik ^b   Gullikson, Eric ^b   Naulleau, Patrick ^b   Salmassi, Farhad ^b   Mirkarimi, Paul ^c   Spiller, Eberhard ^c   Baker, Sherry ^c  

^a INTEL CORPORATION   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHASE DEFECTS; PROGRAMMED DEFECT MASK (PDM);

DEFECTS; DEPOSITION; EXTREME ULTRAVIOLET LITHOGRAPHY; SEMICONDUCTOR MATERIALS;

MULTILAYER FILMS;

EID: 37149047792     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2779044     Document Type: Article

References (13)

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