Investigation of the negative ions in Ar/O2 plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry

Plasma Processes and Polymers

Volumn 8, Issue 5, 2011, Pages 459-464

  Pokorný, Petr ^a   Mišina, Martin ^a   Bulíř, Jiří ^a   Lančok, Ján ^a   Fitl, Přemysl ^a   Musil, Jindřich ^a   Novotný, Michal ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

energy resolved ion mass spectrometry; formation of negative ions; magnetron sputtering; mass spectrometry; transparent conductive oxide

Indexed keywords

ALUMINUM-DOPED ZINC OXIDE; CATHODE VOLTAGES; DISCHARGE PARAMETERS; ENERGY SPECTRA; FORMATION OF NEGATIVE IONS; GAS PRESSURES; ION MASS SPECTROMETRY; MAGNETRON POWER; OPERATION MODE; OXIDE MODE; OXYGEN FLOW; RADIAL POSITION; SUBSTRATE HOLDERS; TRANSITION MODES; TRANSPARENT CONDUCTIVE OXIDES; UNBALANCED MAGNETRON; ZNO;

MAGNETRON SPUTTERING; MASS SPECTROMETRY; METALLIC COMPOUNDS; PLASMA DIAGNOSTICS; SPECTROSCOPY; ZINC; ZINC OXIDE;

NEGATIVE IONS;

EID: 79956007897     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201000195     Document Type: Article

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